(2011). Nitrogen Plasma Effect On The Physical Properties Of Tin Oxide Thin Film. test, 34(1), 7-18. doi: 10.21608/ejs.2011.148856
. "Nitrogen Plasma Effect On The Physical Properties Of Tin Oxide Thin Film". test, 34, 1, 2011, 7-18. doi: 10.21608/ejs.2011.148856
(2011). 'Nitrogen Plasma Effect On The Physical Properties Of Tin Oxide Thin Film', test, 34(1), pp. 7-18. doi: 10.21608/ejs.2011.148856
Nitrogen Plasma Effect On The Physical Properties Of Tin Oxide Thin Film. test, 2011; 34(1): 7-18. doi: 10.21608/ejs.2011.148856

Nitrogen Plasma Effect On The Physical Properties Of Tin Oxide Thin Film

Egyptian Journal of Solids
Article 1, Volume 34, Issue 1, 2011, Pages 7-18    PDF (1.46 M)
DOI: 10.21608/ejs.2011.148856
Abstract
An enhancement of structural, optical and electrical properties of tin
oxide thin films could be obtained by exposing these films to DC pseudo
nitrogen plasma. The films were prepared by spray pyrolysis method, and then
the properties are measured at different exposure times of plasma. It is found
that the exposure time (~ 15 minutes) enhances the transmittance of the tin
oxide while larger times decrease it. Also, it is found that; there is a dramatic
change in thickness, optical band gap and the resistivity with changing the
exposure time.
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