(2017). EFFECT OF ANNEALING TEMPERATURE ON THE REFRACTIVE INDEX OF TITANIUM DIOXIDE (TIO2) THIN FILMS DEPOSITED BY THERMAL EVAPORATION TECHNIQUE. test, 46(1), 1-10. doi: 10.21608/aunj.2017.221401
. "EFFECT OF ANNEALING TEMPERATURE ON THE REFRACTIVE INDEX OF TITANIUM DIOXIDE (TIO2) THIN FILMS DEPOSITED BY THERMAL EVAPORATION TECHNIQUE". test, 46, 1, 2017, 1-10. doi: 10.21608/aunj.2017.221401
(2017). 'EFFECT OF ANNEALING TEMPERATURE ON THE REFRACTIVE INDEX OF TITANIUM DIOXIDE (TIO2) THIN FILMS DEPOSITED BY THERMAL EVAPORATION TECHNIQUE', test, 46(1), pp. 1-10. doi: 10.21608/aunj.2017.221401
EFFECT OF ANNEALING TEMPERATURE ON THE REFRACTIVE INDEX OF TITANIUM DIOXIDE (TIO2) THIN FILMS DEPOSITED BY THERMAL EVAPORATION TECHNIQUE. test, 2017; 46(1): 1-10. doi: 10.21608/aunj.2017.221401

EFFECT OF ANNEALING TEMPERATURE ON THE REFRACTIVE INDEX OF TITANIUM DIOXIDE (TIO2) THIN FILMS DEPOSITED BY THERMAL EVAPORATION TECHNIQUE

Assiut University Journal of Multidisciplinary Scientific Research
Volume 46, Issue 1, June 2017, Pages 1-10    PDF (479.98 K)
Document Type: Novel Research Articles
DOI: 10.21608/aunj.2017.221401
Abstract
Titanium dioxide (TiO2) has attracted much attention in the past decades. TiO2 thin films were prepared using vacuum thermal evaporation technique and then heat treated at different annealing temperatures. An optical characterization method, based only on the transmission spectra at normal incidence of uniform thin films, was used to obtain the refractive index n.   The dispersion of n is discussed in terms of the single-oscillator Wemple and DiDomenico model. The dispersion parameters,  and  decreases after annealing at different temperatures for 3h. The obtained results were discussed in terms of an increasing the packing density of the deposited films after annealing treatment.
Keywords
Thin films; Oxide semiconductor; Titanium dioxide; Refractive index
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